设备名称 Equipment Name

管式A&P设备 Horizontal PEALD (A&P)

管式A&P设备型号 Equipment Model

PD-520L/PD-520MAX

设备用途 Equipment Application

AlO+SiN薄膜沉积。

AlO+SiN Thin-film Deposition.

管式A&P设备技术特点 Features

1、原子层沉积工艺特性，成膜均匀性好。

Atomic layer deposition process, with better film uniformity.

2、同机台或同管完成多层膜沉积，减少工艺环节，有效提升良率、降低碎片率。

Multi-layer thin film deposited in the same process equipment or same furnace tube, reducing process steps and wafer breakage rate, improving yield effectively.

3、自主研发液态源前驱体蒸气输送与前驱体快速切换技术。

Independent R&D of liquid source precursor vapor delivery and precursor rapid switching technology.

4、适应不同前驱体、不同材料钝化层沉积，工艺拓展空间大。

Suitable for deposition of passivation layer for different precursors and materials, with a large space for process expansion.

设备参数 Parameters

·最大兼容硅片尺寸:230mm

·Max.Compatible Wafer Size:□230mm

·单机管数:6管

·Tube Configuration:5 tubes/6 tubes

·单管装片量Loading Capacity/Tube

机型Model:182□210

PD-520L(6管):640片/管(pcs/tube)\504片/管(pcs/tube)

PD-520MAX(6管):768片/管(pcs/tube)\616片/管(pcs/tube)

·单机产能Throughput

机型Model:182\210

PD-520L(6管/tubes):3100片/小时(pcs/h)\2450片/小时(pcs/h)

PD-520LMAX(6管/tubes):3700片/小时(pcs/h)\3000片/小时(pcs/h)

·外形尺寸(mm，含地脚、不含泵)Footprint (mm, incl. leveling foot, excl. pumps)

PD-520L:9570x2150x4410(6管/tubes)

PD-520MAX:11050x2150x4500(6管/tubes)